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Advanced Inorganic Materials Science: Non-Traditional Concepts and Approaches

by Science and Technology of Advanced Materials

Back to Focus Issues

Guest Editor: Naoki Ohashi

Science and Technology of Advanced Materials (STAM) is pleased to present this 2015 focus issue on: Advanced Inorganic Materials Science: Non-Traditional Concepts and Approaches.

We hope you will enjoy reading all the articles published in this issue.

Article TitleAuthor
Focus on advanced inorganic materials science: non-traditional concepts and approachesMitsuru Itoh, Takashi Akatsu, Masaki Azuma, Keigo Kamata & Toshio Kamiya
Recent advances in understanding the reinforcing ability and mechanism of carbon nanotubes in ceramic matrix compositesMehdi Estili & Yoshio Sakka
Recent progress in advanced optical materials based on gadolinium aluminate garnet (Gd3Al5O12)Ji-Guang Li & Yoshio Sakka
Wurtzite-derived ternary I–III–O2 semiconductorsTakahisa Omata, Hiraku Nagatani, Issei Suzuki & Masao Kita
Recent progress in the development of solid catalysts for biomass conversion into high value-added chemicalsMichikazu Hara, Kiyotaka Nakajima & Keigo Kamata
Negative thermal expansion induced by intermetallic charge transferMasaki Azuma, Kengo Oka & Koichiro Nabetani
High-pressure synthesis, crystal structure, and magnetic properties of KSbO3-type 5d oxides K0.84OsO3 and Bi2.93Os3O11Yahua Yuan, Hai L Feng, Youguo Shi, Yoshihiro Tsujimoto, Alexei A Belik, Yoshitaka Matsushita, Masao Arai, Jianfeng He, Masahiko Tanaka and Kazunari Yamaura
Combination of supported bimetallic rhodium–molybdenum catalyst and cerium oxide for hydrogenation of amideYoshinao Nakagawa, Riku Tamura, Masazumi Tamura and Keiichi Tomishige
Effects of SO2 on selective catalytic reduction of NO with NH3 over a TiO2 photocatalystAkira Yamamoto, Kentaro Teramura, Saburo Hosokawa and Tsunehiro Tanaka
Cupric oxide inclusions in cuprous oxide crystals grown by the floating zone methodLaszlo Frazer, Kelvin B Chang, Kenneth R Poeppelmeier and John B Ketterson
The effects of electric field and gate bias pulse on the migration and stability of ionized oxygen vacancies in amorphous In–Ga–Zn–O thin film transistorsYoung Jun Oh, Hyeon-Kyun Noh and Kee Joo Chang